| Chemical Vapor Deposition |
| CFD is used for Chemical Vapor Deposition (CVD) process
analysis that is used to generate thin films such as silicon on printed circuit boards. SC/Tetra can handle a multiple-gas mixing analysis as well as a single
carrier gas. |
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| Dye Coating |
| CFD analysis is also used for the analysis of the dye coating
process. This process uniformly coats materials with a dye liquid (paint) using wall movement. The free surface condition is used at the liquid/air
interface since the thickness of liquid is the parameter being calculated. CFD enables conducting parametric analyses to evaluate the effects of changing the velocity of
the moving wall, wall roughness, viscosity and velocity of the liquid. |
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| Mixing Tank |
For a mixing tank that mixes multiple materials, SC/Tetra is used to evaluate the
performance of the mixing blades and mixing tank pattern. STREAM can be used to evaluate mixing multiple materials
These tools can be applied to simulate a wider variety of chemical phenomena by using additional functions such as chemical reaction, particle tracking, and multi-phase
flow along with the simple thermal/fluid analysis. |
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